METHOD FOR MEASURING THICKNESS OF THIN FILM AND MAPPING TOPOGRAPHY OF ITS SURFACE USING WHITE LIGHT INTERFEROMETER Russian patent published in 2018 - IPC G01B9/02 G01B11/06 

FIELD: measuring equipment.

SUBSTANCE: when implementing a method for measuring the thickness of a thin film and mapping the topography of its surface using a white light interferometer, a substrate with a coated measured film is exposed to white light and a set of correlograms is measured. A substrate that does not contain the measured film is preliminary exposed to white light with a limited coherence, and correlograms are measured, after which a reference correlogram is extracted. In addition, the set of correlograms is measured pixel by pixel, which are approximated by the weighted sum of two or more reference correlograms, a set of film thicknesses and the positions of its substrate are calculated, which results in mapping of surface topography and film thickness.

EFFECT: increased accuracy of determining the thickness of thin films and increased topographic resolution of topographic mapping of the film surface.

4 cl, 5 dwg, 1 tbl