FIELD: chemistry.
SUBSTANCE: invention relates to a container comprising the housing unit which includes an organic treatment solution representing an organic developer for forming the structure of the resistol chemical amplification film. Wherein the organic treatment solution contains the organic 1 part / million or less of alkylolephine having the number of carbon atoms of 22 or less, and 5 pt. / million or less of the metal element concentration for each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn. the housing unit has an inner wall that comes into contact with the organic treatment solution, wherein the inner wall is made of perfluoro resin. The organic developer contains at least one developer selected from the group consisting of a ketone-based solvent, an ester-based solvent, an alcohol-based solvent, an amide-based solvent and an ether-based solvent. A container embodiment, a method of forming the structure of the resistol film of chemical amplification and a method of manufacturing the electronic device are proposed as well.
EFFECT: invention allows to reduce the occurrence of particles, which create problems in the fine structure.
10 cl, 3 tbl, 16 ex
Title | Year | Author | Number |
---|---|---|---|
METHOD OF PRODUCTION OF SHEET ELECTROTECHNICAL STEEL WITH ORIENTED STRUCTURE | 2016 |
|
RU2686711C2 |
TONER, DEVELOPER, IMAGE FORMING DEVICE AND IMAGE FORMING METHOD | 2012 |
|
RU2558009C1 |
IMAGE FORMING METHOD, ELECTRONIC DEVICE MAKING METHOD AND ELECTRONIC DEVICE | 2014 |
|
RU2609105C1 |
LIFT-OFF PHOTOLITHOGRAPHY METHOD | 2015 |
|
RU2610843C1 |
METHOD OF FORMING MASK | 0 |
|
SU604519A3 |
ELECTROSTATIC LATENT IMAGE DEVELOPING WHITE DEVELOPER, IMAGE CREATION METHOD, IMAGE FORMING APPARATUS AND PROCESS CARTRIDGE | 2015 |
|
RU2659098C1 |
RESIN COMPOSITION FOR TONER, TONER, DEVELOPER AND IMAGE FORMING APPARATUS | 2013 |
|
RU2581041C1 |
TONER DEVELOPING ELECTROSTATIC IMAGE, IMAGE FORMING DEVICE, IMAGE FORMING METHOD AND PROCESS CARTRIDGE | 2012 |
|
RU2555182C2 |
TONER, DEVELOPER, AND IMAGE FORMING DEVICE | 2014 |
|
RU2625260C1 |
METHOD OF FORMING POSITIVE PHOTORESIST MASK (VERSIONS) | 2014 |
|
RU2552461C1 |
Authors
Dates
2017-04-04—Published
2013-10-17—Filed