FIELD: information technologies.
SUBSTANCE: invention relates to field of lithography and refers to image forming method. Method includes application of solvent onto substrate, application of radiation-sensitive polymer composition onto substrate so, that result was radiation-sensitive film formation, radiation-sensitive film irradiation with light, development of irradiated film with developer, containing organic solvent to form negative image. Polymer composition is deposited on substrate while, solvent remains on substrate. Solvent is chosen so, that solvent steam pressure was from 0.2 kPa to 0.7 kPa at 20 °C.
EFFECT: technical result consists in improvement of obtained lines width uniformity and hidden photoresist residue reduced formation.
10 cl, 7 dwg
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