METHOD OF ION-BEAM PROCESSING OF PRODUCTS WITH A LARGE SURFACE AREA Russian patent published in 2017 - IPC H01J27/00 H01J37/317 

FIELD: physics.

SUBSTANCE: workpieces move across a large beam axis, formed by using ion-optical system containing plasma and accelerating electrodes, each of which contains a large number of slot apertures. Multi-slit structure of ion optical system determines the existence of local inhomogeneities ion current density distribution, resulting in uneven ion-beam processing. Products move angle α_min axis parallel to slot apertures and, as a result, sites get the same surface ion fluence irradiations. Minimum angle α_min=arctg(h/l) is determined from the condition of intersection of the beam region along the diagonal of the unit aperture. Maximum angle of α_max=arccos(H/l) is defined by the conditions of preservation of the optimal length of the aperture. Here l, h is the length and width of the apertures, n-length short axis of beam cross-section.

EFFECT: achieving uniform ion-beam treatment of products when moving in the ion beam region.

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