ION SOURCE Russian patent published in 2005 - IPC

FIELD: ion-plasma engineering.

SUBSTANCE: proposed closed electron-drift ion source that can be used for designing sources generating ribbon electron beams of inert and chemically active gases has hollow housing that functions as cathode with emission slit and working gas admission ducts made in its butt-end walls, magnetic tips, anode mounted within housing opposite mentioned slit, and magnetomotive force sources; magnetic tips characterized in reduced risk of erosion are provided with removable shielding plates mounted to keep within definite geometry proportions between plate size and emission slit aperture.

EFFECT: enhanced service life, easy disassembly, and reduced maintenance charges of ion source.

4 cl, 2 dwg