ION-OPTICAL ION SOURCE SYSTEM Russian patent published in 2023 - IPC H01J27/08 H01J37/08 

FIELD: high-intensity ion beam sources.

SUBSTANCE: invention relates to ion-optical systems of ion sources designed to operate in a stationary mode. The ion-optical system of the ion source consists of a support flange, on which plasma, accelerating and grounded electrodes are located on insulator stands, each of which contains a plurality of slotted holes. The electrodes are divided into segments. An ion beam is formed in the slot apertures, and the channels of the cooling system are located in the bridges between the slots. Multi-aperture mesh segments are sealed to a common holder and serve as a header for supplying and draining coolant for electrode mesh segments. The coolant is supplied to the collectors through tubes that run inside the insulators, on which the electrode holders rest through the adjusting washers.

EFFECT: increased reliability of the formation of ion beams of high intensity and long duration under conditions of high thermal loads.

1 cl, 1 dwg