METHOD OF MANUFACTURING ONE-DIMENSIONAL DIFFRACTION PHASE GRATING WITH SINUSOIDAL PROFILE Russian patent published in 2017 - IPC G02B5/18 B23K26/364 

Abstract RU 2626734 C1

FIELD: physics.

SUBSTANCE: method of manufacturing a one-dimensional diffraction phase grating with a sinusoidal profile consists in sequentially forming grooves by scanning with a pulsed laser beam of the plate contact plane of fused quartz with a plate of pressed graphite. The interruption of scanning after completion of the groove formation with a period corresponding to the grating period, which is provided by the discrete displacement of the focused laser beam, the depth of the groove relief profile being formed with an energy dependent on the pulsed power density, pulse duration, the diameter of the impact area, the number of pulses, the repetition rate, the scanning speed. The surface of the grating is cleaned by wet laser cleaning.

EFFECT: reducing the groove shape deviation from the sinusoidal profile along the entire length of the groove, reducting the deviations in the form of the groove from groove to groove within the diffraction phase grating, eliminating microcracks surrounding the grooves, expanding the depth range of the diffraction phase grating.

13 dwg

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RU 2 626 734 C1

Authors

Koval Vladislav Vyacheslavovich

Kostyuk Galina Kirillovna

Zakoldaev Roman Alekseevich

Sergeev Maksim Mikhajlovich

Yakovlev Evgenij Borisovich

Rymkevich Vladimir Sergeevich

Vejko Vadim Pavlovich

Dates

2017-07-31Published

2016-08-04Filed