FIELD: physics.
SUBSTANCE: method for manufacturing diffraction gratings involves applying a material layer to the substrate, forming strokes in it, and removing the material layer through reactive ion-beam etching. The strokes formed in the material layer are used as processing strokes, which are completely removed together with the remaining thickness of the material layer. Reactive ion-beam etching is carried out at an angle of 90° to the surface of the substrate while forming strokes with an angle of "shine" and with the given period of the grating in the substrate. A material the etching rate of which is higher than the etching rate of the substrate material is used as a material of the technological strokes.
EFFECT: improving the manufacturing quality of the diffraction gratings and providing the opportunities for stroke profile close to the ideal triangular, with the shine angles in the range of 80-87 degrees.
4 dwg
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