FIELD: technological processes.
SUBSTANCE: method comprises preliminary calculation of the number of layers of film-forming materials – zirconia and silicon dioxide for wavelengths of 1.351 mcm and 1.54 mcm, and introduction of calculated data and wavelengths into a photometric device of a vacuum unit, applying a mirror coating in the form of alternating, quarter-wave layers of film-forming materials on one substrate surface and first reference sample, the first layer is made of zirconium dioxide, the protective layer is made of silicon dioxide, with controlling the thickness of each layer by the photometric device of the vacuum unit by changing the first reference sample transmittance coefficient at a wavelength of 1.067 mcm, applying, on reverse surface of the substrates and surface of the second reference sample, layers of film-forming materials calculated for the other indicated wavelengths with a control of the thickness of the layers by changing second reference sample transmittance at a wavelength of 1.067 mcm.
EFFECT: technical result is increased mirror reflection coefficient and decreased reflection coefficient.
2 cl, 3 dwg
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Authors
Dates
2018-02-21—Published
2016-12-16—Filed