DUOPLASMATRON WITH LOW OUTPUT GAS FLOW Russian patent published in 2001 - IPC

FIELD: charged-particle sources; acceleration engineering. SUBSTANCE: duoplasmatron has discharge chamber, cathode, intermediate electrode, electromagnet, and anode with charged-particle emission channel. Novelty is introduction of evacuation channel communicating on one end with charged-particle emission channel and on other end, with vacuum pump; charged-particle emission inlet on cathode side is made in the form of cone. Proposed modifications provide for dispensing with flap closing charged-particle emission channel so that non-ionized working gas can be evacuated preventing its escape from source. Cone at emission channel inlet enables non-ionized gas flow to acquire speed component in direction other than that along which charged-particle beam current is extracted. While deflecting from the latter gas enters evacuation channel characterized by higher gas conductivity than charged-particle emission channel and is evacuated by means of vacuum pump. EFFECT: reduced gas flow at duoplasmatron outlet in the course of continuous charged-particle beam generation. 1 dwg