METHOD OF GAS DISCHARGE INITIATION Russian patent published in 2018 - IPC H05H1/24 

Abstract RU 2656341 C1

FIELD: plasma technologies.

SUBSTANCE: invention relates to the field of plasma technology, in particular to methods of stable initiation of a gas discharge at high and low pressure, used for obtaining radiation in gas-discharge lasers, plasmatrons. In the method of gas discharge initiation, consisting in a spark breakdown of the interelectrode gap between the auxiliary electrodes for exciting an arc discharge between the main electrodes, according to the invention, cause a high-voltage breakdown of the discharge gap of the main discharge at 7–20 kV and its stable combustion at 1–20 mA, using a discharge from a powerful 20–400 mA discharge source with a small output voltage of 1–500 V between the main electrodes. In this case, the total input power from 10 W to 1.5 kW.

EFFECT: technical result is the stabilization of the combustion of a gas discharge in a wide range of capacities with a low voltage of a powerful source, increasing the safety of work.

1 cl, 1 dwg

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RU 2 656 341 C1

Authors

Bogdanov Pavel Vladimirovich

Shutov Dmitrij Aleksandrovich

Ivanov Aleksandr Nikolaevich

Dates

2018-06-05Published

2017-03-02Filed