FIELD: measuring equipment.
SUBSTANCE: invention relates to the measurement equipment and can be used in scanning probe microscopy. Probe for the scanning probe microscopy contains cantilever for the atomic force microscopy with the located on the cantilever needle tip optically active region. Active region is the hybrid nanoparticle from the semiconductor material with metal coating of 50–300 nm in diameter. Cantilever material is silicon or silicon nitride, and the nanoparticle consists of the gold-plated silicon. Probe manufacturing method consists in the nanoparticle formation with the close to the spheroid shape on the cantilever needle tip. In one embodiment, the semiconductor material nanoparticle is preliminarily manufactured by the laser ablation method from the deposited on transparent substrate layered metal-semiconductor structure, after which the nanoparticle together with the cantilever are placed into the scanning electron microscope chamber, where nanoparticle transfer from the substrate to the point of the cantilever needle tip is performed using the located on the three-coordinate micromanipulator in the scanning electron microscope chamber metal tip. In the second embodiment, the semiconductor nanoparticle is formed directly on the cantilever needle tip by irradiating the unfunctionalized semiconductor cantilever tip for atomic force microscopy brought into contact with the thin metal layer surface, by the laser pulses with duration of not more than the microsecond.
EFFECT: technical solution enables high spatial resolution and sub-wavelength resolution.
6 cl, 8 dwg
