FIELD: optics.
SUBSTANCE: invention provides a method of making a mask for patterning a three-dimensional substrate. Mandrel includes a form machined in a surface corresponding to a shape of the substrate. Layer of material is deposited in a first region of the form and a metal layer is deposited in a second region of the form. Portion of the mandrel is subsequently removed.
EFFECT: present invention also provides a method of patterning a three-dimensional substrate with a mask.
21 cl, 18 dwg
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