DEVICE FOR PROJECTING MASK WITH BEAM OF FEMTOSECOND AND PICOSECOND LASER, CONTAINING LIMITER, MASK AND SYSTEM OF LENSES Russian patent published in 2019 - IPC B23K26/66 B23K26/04 B23K26/352 

FIELD: instrument engineering.

SUBSTANCE: invention relates to device for macro structuring of substrate surface by means of femtosecond or picosecond laser beams projected by means of mask. Device provides for projection of mask onto surface of substrate by means of specified pulse laser beams (2) so that in certain location on optical axis to receive pulses of laser beam with increased cross section of laser beam or pulses of laser beam with reduced cross section of laser beam, and uniform distribution of intensity along its cross section. On path of beam (2) at said location there are successively arranged limiter (6) with preset geometry of aperture of limiter and mask (7) with preset geometry of mask aperture. Field-effect lens system (8) and imaging lens (10) are arranged such that non-diffracted and diffracted components of laser beam (2) of pulses transmitted through limiter (6) and mask (7) are directed into lens (10), forming an image having a predetermined aperture using a field-effect lens system (8) such that in a cross-section of said laser beam of pulses in the image formation plane, a reduced intensity distribution image formed by limiter (6) and mask (7) is generated, image is accurate in each part and having a given scale of image formation. In the first embodiment, the additional lens system (16), the field-effect lens system (8) and imaging forming lens (10) are positioned relative to each other such that focus (19) is created between the image forming lens (10) and substrate surface. In compliance with second version, additional lens system (16), field-effect lens system (8) and image forming lens (10) are arranged relative to each other such that between field lens system (8) and image forming lens (10), focus (22) is created. Device contains at least one vacuum cell surrounding focal area (19) and focus area (22).

EFFECT: disclosed is a device for projecting a mask with a beam of a femtosecond and a picosecond laser, having a limiter, a mask and lens systems.

10 cl, 5 dwg