FIELD: chemistry.
SUBSTANCE: invention relates to a method of producing indium-tin oxide. Indium and tin are sputtered from the target onto the substrate. Sputtering involves moving the target along the path over the substrate. Indium-tin oxide can have specific surface resistance of less than 0.5 Ohm/square. Indium-tin oxide film contains the first sputtered layer of indium-tin oxide, the second sputtered layer of indium-tin oxide on the first layer and the third sputtered layer of indium-tin oxide on the second sputtered layer of indium-tin oxide.
EFFECT: glazing includes such an indium-tin oxide, and the aircraft includes this glazing.
21 cl, 8 dwg, 3 tbl
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