FIELD: chemistry.
SUBSTANCE: invention relates to chemical deposition of a coating by deposition of a compound using electric discharges and plasma jets, and can be used in engine building, aircraft engineering and machine building. Device for forming a coating from cubic tungsten carbide on a metal substrate has a source of tungsten- and carbon-containing plasma, a chamber whose volume is limited by two metal covers which are fixed to it by bolt joints. As source of tungsten- and carbon-containing plasma there used is coaxial magnetoplasma accelerator, in which cylindrical electroconductive barrel is made of two electroconductive cylinders of inner cylinder from graphite and external cylinder from strong non-magnetic material, central electrode consisting of graphite tip and steel shank. Barrel and central electrode are electrically connected by fuse link made of pressed mixture of powders of tungsten and soot in atomic ratio C:W from 0.30:0.70 to 0.65:0.35. Housing of said accelerator is made of magnetic material, is conjugated with external metal cylinder and covers zone of fuse connection. Key and capacitor bank connected to the first bus line are connected in series to the second bus duct connected to the shank of the central electrode. Free end of the barrel of the accelerator is inserted into the reactor chamber through an axial hole in its first metal side cover.
EFFECT: obtaining coating from cubic tungsten carbide with thickness of 30–50 mcm and hardness of 30,8±0,5 to 32,5±0,7 GPa on a metal substrate.
1 cl, 3 dwg, 1 tbl
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Authors
Dates
2019-11-28—Published
2019-07-11—Filed