FIELD: technological processes.
SUBSTANCE: invention relates to ion-beam vacuum processing of materials and can be used in plasma sources of charged particles and, in particular, in machine building for hardening of cutting tool, improvement of operational properties of parts of machines and mechanisms. Device of plasma source of non-self-sustained gas discharge with effect of hollow cathode, comprising hollow cathode of main discharge, anode of main discharge, hollow cathode of auxiliary discharge, device for gas supply, accelerating electrode, collector, emission window in the form of a grid is characterized by the fact that the emission window is made in the form of coaxial hollow cylinders, the radii of which are connected by the ratio Rn=nR, where n – sequence number of cylinder, starting from first, and length L of cylinders is connected to radius of first cylinder by ratio L/2R1=10.
EFFECT: increasing uniformity of treatment of large-size items and speed of process.
1 cl, 2 dwg
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Authors
Dates
2020-01-16—Published
2019-06-10—Filed