MULTIBEAM GENERATOR OF GAS-DISCHARGE PLASMA Russian patent published in 2008 - IPC H05H1/24 

FIELD: physics.

SUBSTANCE: invention refers to production of microcircuit directed flows on active and passive substrates and in diffraction optics of low temperature plasma and generation of high current ion beams and can be used in microelectronics to manufacture integrated microcircuits and diffraction optics components. The multibeam generator of gas-discharge plasma contains hollow cathode, anode, isolation, high-voltage input. Hollow cathode whereto the base is attached, is coaxially fixed in hollow anode, isolation layer being arranged between cathode and anode of thickness λ<h<3λ, where λ is electron free length in gas-discharge plasma flow, h is thickness of isolation layer between cathode and anode. Anode is covered to form hermetic cavity. Anode, cathode and isolation are provided with coaxial apertures of equal dimension and shape. Isolation layer between anode and cathode surfaces can be made of fluoroplastic or polystyrene.

EFFECT: chances to generate several plasma flows of various section shapes at simultaneous increase in gas-discharge plasma current, reduction of electrodes voltage in gas-discharge system and simplification of its design and operation.

2 cl, 1 dwg