FIELD: machine building.
SUBSTANCE: invention can be used for coating a substrate by coating with low reflecting power. Substance of the invention consists in that the method of coating the substrate with carbon nanostructures, comprising steps of: (i) obtaining a suspension of carbon nanostructures in a solvent; (ii) preheating the substrate to a temperature sufficient to cause evaporation of the solvent upon contact of the suspension with the substrate; and subsequent (iii) depositing the suspension onto the substrate by spraying; (iv) maintaining substrate temperature sufficient during step (iii) to maintain evaporation of spraying solvent; (v) repeating steps (iii) and (iv) until a substrate is coated with a layer of carbon nanostructures having a thickness of at least 2 micrometers; and (vi) plasma etching of the coating to reduce film density and create optical cavities in the coating, adding the optical spacer to the suspension prior to the deposition step to create optical cavities in the coating or a combination of those steps.
EFFECT: low reflection capacity of the coating.
45 cl, 19 dwg, 2 tbl
