METHODS AND SYSTEMS FOR REMOVING ALKYL IODIDE IMPURITIES FROM RETURN GAS STREAM WHEN PRODUCING ETHYLENE OXIDE Russian patent published in 2020 - IPC C07D301/32 C07C17/38 C07C19/07 

FIELD: chemistry.

SUBSTANCE: disclosed is a method of producing ethylene oxide, ethylene carbonate and/or ethylene glycol, involving contacting at least a portion of a return gas stream containing an alkyl iodide impurity, with a protective layer material to obtain a cleaned return gas stream, wherein said protective layer material comprises a spherical substrate material having a diameter of less than 2 mm, and silver deposited on the spherical material of the support in amount of 2 to 10 % by weight, and contacting the epoxidation feed gas containing ethylene, oxygen and at least a portion of the cleaned return gas stream with the epoxidation catalyst to obtain an epoxidation reaction product containing ethylene oxide. Also disclosed is a reaction system for producing ethylene carbonate and/or ethylene glycol.

EFFECT: technical result is to improve the materials of the protective layer and an improved method of removing certain gaseous iodine impurities from the return gas stream when producing ethylene oxide, ethylene carbonate and/or ethylene glycol.

16 cl, 3 tbl, 4 dwg, 2 ex