FIELD: plasma treatment of surface.
SUBSTANCE: electrode structure for formation of dielectric barrier plasma discharge between electrode (1), which is supplied from control device (20) with high alternating voltage, and subject to treatment surface (21) of electroconductive body (22), which serves as earthing electrode, comprises dielectric (8), which completely closes electrode (1) from surface (21) to be treated and forms a support side for said surface (21). Electrode (1) is made of at least two partial electrodes (2, 3) arranged next to each other with identical gap (6) relative to support side and isolated from each other by dielectric (8). Neighboring partial electrodes are supplied from control device (20) by mutually compensating partial alternating voltages, mirror-like in form of wave and voltage.
EFFECT: technical result is higher efficiency and uniformity of plasma for processing large surfaces (21).
7 cl, 3 dwg
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