ELECTRODE SYSTEM FOR PLASMA TREATMENT WITH DIELECTRIC BARRIER Russian patent published in 2020 - IPC H05H1/24 

FIELD: chemistry.

SUBSTANCE: invention relates to a system of electrodes for plasma treatment with a dielectric barrier. According to invention in system of electrodes for plasma treatment with dielectric barrier of surface of electrically conductive body used as counter electrode, with flexible flat electrode (1) and dielectric (2) of flat flexible material, which by means of layer (3), preventing flow of direct current, shields electrode (1) from treated surface, wherein dielectric (2) can be adjacent to processed surface through structure with projections, and between projections air cavities for formation of plasma are formed, manufacturability of production is especially improved by that structure represents lattice structure (6) from adjoining walls (7, 8), which limit numerous chambers (9) forming air cavities, and at that, chambers (9) have barrier at the bottom side by means of dielectric (2) layer (3) preventing direct current flowing and side open to processed surface, contact surface of which with processed surface consists of end edges (10) of walls (7, 8) of lattice structure (6).

EFFECT: reliability of a system of electrodes, improvement of manufacturability of a system of electrodes.

13 cl, 10 dwg