METHOD AND DEVICE FOR CLEANING GAS Russian patent published in 2001 - IPC

FIELD: gas cleaning devices. SUBSTANCE: method consists in treatment of gas flow between receiving electrodes coated with layer of homogeneous dielectric and perforated over working surface; electrode gas is filled with unipolar space charge extracted from plasma zone of barrier discharge. Barrier discharge plasma is activated in form of plasma columns above perforations of one of receiving electrodes. Device is provided with additional plate-type electrodes: one electrode is made in form of metal plate with needles whose pointed edges lie above centers of perforations of receiving electrodes at equal distance from surface of receiving electrode; other additional electrode coated with layer of homogeneous dielectric is mounted at before-breakdown distance from surface of opposite receiving electrode. Elevated temperature in plasma columns formed at pointed edges of needles of one of additional electrodes prevents formation of ozone molecules increasing concentration of changed particles in plasma discharge; position of plasma columns of discharge above perforations of receiving electrode provides for coincidence of directions of motion of charge carriers with direction of field lines of electric field between receiving electrodes, thus facilitating extraction of charge carriers into electrode gap during voltage half- wave, higher discharge of dispersed dielectric admixture and enhanced settling on receiving electrodes during respective period of time. EFFECT: enhanced efficiency. 5 cl, 1 dwg