FIELD: chemical vapor deposition methods.
SUBSTANCE: invention relates to a modified chemical vapor deposition method for the manufacture of radiation-resistant optical fibers with a fluorosilicate cladding and an oxygen-depleted silica glass core. The claimed method for the manufacture of radiation-resistant optical fibers includes the manufacture of MCVD by the method of a tubular blank, with the deposition of layers of a fluorosilicate cladding and a core of pure quartz glass, under high-temperature compression of which its inner channel is blown with dry nitrogen or argon with an impurity oxygen content of no more than 10-4 vol. %. In this case, the layers of the shell and the core are applied in a two-stage method, consisting of the deposition of a porous layer with the opposite direction of the burner and the flow of the gas mixture inside the tube, followed by vitrification of the porous layers with the direction of the flow of the gas mixture containing moisture and oxygen, not more than 10-4 vol.%.
EFFECT: increasing the radiation resistance of quartz fluorosilicate optical fibers.
1 cl, 2 dwg
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Authors
Dates
2022-01-12—Published
2021-05-20—Filed