FIELD: electroplating.
SUBSTANCE: invention relates to the field of electroplating and can be used in mechanical engineering, instrument making and other fields. The method consists in the fact that at the first stage, galvanic deposition of chromium is carried out, for which the cathode - product is placed in an electrolytic bath with chromium plating electrolyte, then an anode is placed parallel to the cathode, while a capacitive induction filter is connected to the electrical circuit, an electric current of 100-200 A/dm2 and voltage 40-60 V, current treatment is carried out to form a chromium layer on the metal surface; at the second stage, exposure to plasma is carried out, for which, when the thickness of the chromium coating reaches 0.5 mcm at the first stage, the voltage of electrochemical deposition of chromium is increased to values of 150-200 V, as a result of which a gas discharge burns in a vapor-air shell, covering the entire surface of the plate, after this, the discharge burning is quenched by reducing the voltage value until the plasma glow visually ceases with bringing the current density to 40 A/dm2, the first and second stages are repeated until the desired coating thickness is obtained. The device includes a bath with an electrolyte, a cathode - a product and an anode; the following are connected to the electrode system: a power supply system, an oscilloscope with the ability to control the shape of the supplied voltage and electric current, additional resistance, a voltmeter, an ammeter, a thermocouple, while the power system consists of a diode bridge, a laboratory autotransformer, and a capacitive induction filter, which is a high-voltage direct current source.
EFFECT: obtaining a nanostructured chromium coating.
6 cl, 6 ex, 3 dwg
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Authors
Dates
2022-05-04—Published
2021-09-28—Filed