METHOD FOR CONSTRUCTING AN EXTENDED ANTENNA FIELD Russian patent published in 2022 - IPC G01S5/00 

FIELD: radio engineering.

SUBSTANCE: area of application: invention relates to the field of radio electronics, radio astronomy, and extended antenna fields (AF) used as high-gain effective antennas for exploration of far and near outer space. Substance: method consists in determining the angular coordinates of orientation of the main beam in the angular sector of existence of the maximum values of amplitude of the main vector component of the electromagnetic field, determining the antenna pattern (AP), by the method of correlation processing of the received signals, wherein at the same time said direction complies with the condition of alignment of the position of the phase centre (PC) of the aperture of the AF with the measured direction of maximum of the AP, taken as the origin of coordinates, and the boundary of the far-field region for the AF is ensured to be highly distanced from the location of the AF due to the extended length thereof. I.e., as is evident from the previously proven statement, the phase characteristic of the AF in this direction is spherical, and the AF can be considered a point source for observation in the far-field region, and the geometric position of the maximum value of the field at this point is taken as the PC of the AF. In planar (two-dimensional) equidistant antenna arrays, elements are usually positioned at the nodes of the rectangular or triangular array. The distances between the emitters are selected within a single wavelength at the upper limit of the frequency band, providing a possibility of generating an antenna pattern with one main beam and a low level of side lobes (LSL). The necessary directivity and low LSL can be obtained by using a non-uniform amplitude distribution in the antenna array (e.g., by Dolph-Chebyshev) or using non-equidistant positioning of the elements of the antenna array.

EFFECT: determination of the position of the PC in the aperture of the AF, ensured location the boundary of the far-field region for the AF at a significantly greater distance from the location of the AF due to the extended length thereof, and improved operation thereof.

1 cl, 6 dwg