COMPOSITION HAVING REDUCED RESIDUE Russian patent published in 2022 - IPC A61K8/00 A61K8/37 A61K8/73 A61Q19/00 

Abstract RU 2774826 C2

FIELD: cosmetic industry.

SUBSTANCE: inventions group relates to the field of cosmetic industry, namely to a composition for application to the skin, where said composition allows skin massage, where the composition includes: 0.75 wt.% an olivat having a hydrophilic-lipophilic balance (HLB) value of 4 to 10; 2.0 wt.% isopropyl palmitate and from 0.1 to 3.0 wt.% regenerated cotton powder dispersed throughout said composition, and also to a method for applying a non-rinsing composition to the skin of a mammal, where the method includes the steps of: a) applying to the skin the desired amount of the composition, comprising: 0.75 wt.% olivat having an HLB value of 4 to 10; 2.0 wt.% isopropyl palmitate and from 0.1 to 3.0 wt.% regenerated cotton powder dispersed throughout said composition; and b) rubbing the composition onto the skin surface for the desired period of time; wherein, 5 minutes after the application step, the level of residue on the area of ​​the skin to which the composition was applied is below 40 mcg/cm2, as measured by a sebum meter.

EFFECT: inventions group provides for the development of compositions that allow prolonged skin massage and leave low levels of residue on the skin after application.

8 cl, 2 ex, 7 tbl, 2 dwg

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RU 2 774 826 C2

Authors

Garsiya, Devin

Kaur, Simarna

Nikolovski, Dzhaneta

Deridder, Luis

Dates

2022-06-23Published

2018-03-07Filed