FIELD: optics.
SUBSTANCE: invention can be used in manufacturing reflective optical elements of optoelectronic apparatus. Optical mirror comprises a substrate, a chromium adhesive layer, a reflective layer, and an yttrium oxide protective layer. The mirror additionally comprises a silicon dioxide layer located between the reflective layer and the protective layer, and the reflective layer is made of copper. The thicknesses of the chromium, copper, silicon dioxide, and yttrium oxide layers are 50…100 nm, 150…200 nm, 80…90 nm, and 90…100 nm, respectively.
EFFECT: increase in the reflection coefficient in all working spectral ranges.
1 cl, 4 dwg
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Authors
Dates
2022-08-23—Published
2021-08-19—Filed