PROJECTION SYSTEM AND METHOD WITH ADJUSTABLE ILLUMINATION ANGLE USING LENS CENTER OFFSET Russian patent published in 2023 - IPC G03B21/20 G03B21/00 G02B26/08 

Abstract RU 2804461 C1

FIELD: optics.

SUBSTANCE: projection system comprises a light source, an optical illumination system comprising a first lens group and a second lens group; a digital micromirror device comprising a plurality of micromirrors, a controller configured to determine the deviation between the actual orientation angle of the micromirror and its expected orientation angle, calculate the first side adjustment value corresponding to the first lens group, and the second side adjustment value corresponding to the second lens group, and bring actuating the first lens group in the first direction according to the first value and the second lens group in the second direction according to the second value.

EFFECT: increased clarity and contrast ratio by providing the correct angle of incidence on the micromirror device.

20 cl, 8 dwg

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RU 2 804 461 C1

Authors

Jackson, John David

Hennigan, Darren

Wainwright, Nathan Shawn

Dates

2023-10-02Published

2021-10-21Filed