FIELD: optics.
SUBSTANCE: invention relates to optics and can be used to improve the accuracy of ellipsometric measurements carried out in the process of in situ diagnostics. A device for controlling the direction of optical radiation in ellipsometry for in situ diagnostics of the formation of layered structures comprises, in the analyser arm of the ellipsometer in the direction of propagation of the optical beam, a limiting aperture optically connected in series, a device that increases the propagation of a quasi-parallel optical beam between the specified aperture and the matrix to a length that provides increased sensitivity to deflection of the direction of the optical radiation, thereby improving the accuracy of determining the angle of reflection of the optical radiation, and the recording photosensitive matrix. The latter is configured to register a complete image of the light spot. The confining diaphragm is designed to provide Fraunhofer diffraction conditions with the possibility of cutting out a quasi-parallel beam.
EFFECT: increasing the accuracy of controlling the angle of reflection of optical radiation to the limits of polarization optics and in eliminating the inhomogeneities of the light spot on the recording photosensitive matrix.
7 cl, 4 dwg, 1 tbl
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RU2270437C2 |
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RU2104617C1 |
Authors
Dates
2023-10-13—Published
2022-11-07—Filed