FIELD: measurement equipment.
SUBSTANCE: invention refers to optical-physical measurement equipment, and namely to ellipsometry, and can be used during non-destructive inspection of optical parametres of surface and thin layers of films. Ellipsometre includes polariser, support for the inspected sample and photorecorder. Poliriser is made in the form of semiconducting single-mode laser with vertical resonator with stabilised polarisation of outgoing bundle. Photorecorder is made in the form of four-platform polarisation sensing photoreceiver made from photo-sensitive semiconducting nanowires located on the platform (base) in the form of parallel sections; at that, platforms are oriented in the following way: one platform is parallel to laser polarisation axis, and the other one - perpendicular to polarisation axis, and two platforms at angles of +45° and -45°. Orientation of the platform is determined as per direction of photosensitive semiconducting nanowires.
EFFECT: invention allows obtaining subminiaturised (with the size of about 10×30×50 mm3) and cheap ellipsometre which is easy to manufacture and to operate.
2 cl, 2 dwg
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Authors
Dates
2010-03-20—Published
2008-12-15—Filed