DEVICE FOR MANAGING GAS FLOW IN OPEN GAS CIRCUIT ON INSULATED CURRENT CONDUCTOR(S), DEVICE FOR MANAGING GAS FLOW ALONG INSULATED CONDUCTOR, WITHOUT OUTER SHELL OF GAS CHANNEL, AND METHOD FOR MANAGING CURRENT IN GAS USING SAID DEVICES Russian patent published in 2023 - IPC B03C3/38 H01T23/00 F24F7/04 H01T19/00 

FIELD: gas transportation; electrical engineering.

SUBSTANCE: device for managing gas flow includes a gas channel, a high-voltage power source, an electrode connected to the high-voltage power source to which negative voltage is applied, and an electrically conductive layer connected to the high-voltage power source to which positive voltage is applied. In this case, between the electrode to which negative voltage is applied, and the bare area, there is an insulated electrode to which positive voltage is applied. Due to this arrangement of the bare area, the cloud of charged gas is drawn out. The method for managing gas flow includes stages in which voltage is applied from the high-voltage power source to the electrodes, negatively charged gas molecules are formed on the negatively charged electrode, negatively charged gas molecules are attracted to the insulated positively charged electrode, and negatively charged gas molecules are moved along the isolated positively charged electrode to the bare area of this electrode, neutralization of negatively charged gas molecules occurs on the bare area.

EFFECT: improved efficiency of gas transportation.

6 cl, 8 dwg