MICROPROCESSING DEVICE AND METHOD OF SURFACE MICROPROCESSING PROCESS MONITORING WHEN EXPOSED TO INTENSE FOCUSED FEMTOSECOND LASER PULSES Russian patent published in 2025 - IPC G02B27/10 B23K26/03 B23K26/144 

FIELD: physics.

SUBSTANCE: invention relates to microscopy of fast processes, namely to nonlinear optical microscopy. Microprocessing device comprises a femtosecond laser, a mirror, a lens, a target mounted on a motor-powered positioner, a polariser, a set of optical filters and a radiation detector, at that, in front of the target along the laser beam there is a rotary dichroic mirror, which provides reflection of laser radiation towards the target and transmission of the second harmonic signal of the visible range towards the detector, which is a digital camera, wherein lens is arranged behind dichroic mirror along laser beam while target is arranged behind gas feed unit along laser beam and is installed with the possibility of rotational and/or reciprocating movement in the direction of the target rotation axis.

EFFECT: registration of change of reverse signal of the second harmonic from near-surface plasma.

8 cl, 1 dwg