METHOD FOR FORMING DEFECTS IN VOLUME OF DIELECTRIC SAMPLE WITH LASER RADIATION Russian patent published in 2018 - IPC B23K26/02 

FIELD: technological processes.

SUBSTANCE: invention relates to the field of laser processing of materials and concerns the method of forming defects in the volume and on the surface of a dielectric. Method includes the generation of femtosecond laser pulses in the short-wave and long-wave ranges, determination of threshold energies for each radiation, reduction of two focused pulses, determination of the time delay of the long-wave pulse, the effect on the sample of laser pulses with the parameters found, control of the process of creating defects. Reduction of the two focused pulses in the first stage is performed by visualizing the photoluminescence regions of the plasma from both pulses, and the time delay between the pulses is determined from the minimum value of the nonlinear transmission of the long-wave pulse. At the second stage, the reduction is carried out by recording the maximum signal of the third harmonic from the long-wave pulse. Parameters of the defects are monitored by recording the signal of an unsynchronized third harmonic from the long-wave pulse generated on the defects formed.

EFFECT: technical result consists in increasing the accuracy of the radiation guidance, reducing the energy of the pulses and providing the possibility of monitoring the processes in real time.

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