METHOD FOR MEASURING DIMENSIONS OF LITHOGRAPHIC LAYER COMPONENTS Russian patent published in 1996 - IPC

FIELD: microelectronics; electronic engineering. SUBSTANCE: method involves formation of magnified image of lithographic layer, measurement of magnified image parameters, and conversion of these parameters into dimensions of components; novelty is that before forming magnified image, holographic grating is made in lithographic layer and latex spheres are applied to its surface; magnified image of lithographic layer is formed by means of raster electronic microscope whereupon the latter is adjusted against latex spheres and parameters of magnified image are measured according to shape of video signal distribution; distance B corresponding to size b and distance D corresponding to holographic grating period d are determined, and these parameters are converted into size of components using formula . EFFECT: improved measurement accuracy, improved yield.