FIELD: physics, optics.
SUBSTANCE: produced device id formed as follows. Photo resistive undeveloped layer is produced on electrically conducting layer. First diffraction mask is made on undeveloped photo resistive layer with the help of optical interferometry. Second diffraction mask is made on undeveloped photo resistive layer with the help of electron-ray lithography. Photo resistive layer is developed.
EFFECT: diffraction masks produced in one photo resistive layer.
26 cl, 16 dwg
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