DRY-FILM PHOTORESIST OF WATER-ALKALINE DEVELOPMENT Russian patent published in 1995 - IPC

FIELD: photoresist. SUBSTANCE: to enhance resolving power and stability to overdevelopment, use is made of some other styrene carboxyl-containing copolymer in photopolarized layer of other quantitative composition. The latter includes, mas.p.: styrene carboxyl-containing copolymer 90-110; n-butanol 2-7; dimethyl phthalate-bis-(dimethylamino)phthalate 30-60; photoinitiator - 4,4'-bis- (dimethylamino)benzophenone 0.25-1.6; benzophenone 3.2-7,274; inhibitor of thermopolymerization 0.005-0.2; dye 0.05-0.25. Dry-film photoresist consists of polyethylene terephthalate base, photopolymerization layer of indicated composition and protective polyethylene film. Styrene carboxyl-containing copolymer has formula indicated in invention description. EFFECT: better coefficient of overdevelopment (up to 5.38 versus 2.75), less minimal width of reproduced line on protective relief (up to 80 versus 135 mcm). 2 tbl