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(21) (22)

Application

3928741/04, 1985-04-25

(22)

Actual filing date

1985-04-25

(45)

Published

1996-12-27

(72)

Inventor

Agabekov V.E.Potkin V.I.Kaberdin R.V.Gudimenko Ju.I.Azarko V.A.Ol'Dekop Ju.A.Mitskevich N.I.

LIGHT-SENSITIVE COMPOUNDS IN VACUUM PHOTOLITHOGRAPHIC PROCESSES Russian patent published in 1996 - IPC

Abstract SU 1351426 A1

FIELD: organic chemistry. SUBSTANCE: product: 1-benzylthio-1-piperidino-1-nitro-3,4,4-trichloro-1,3-butadiene used as a light-sensitive compound in vacuum photolithographic processes. Proposed compound provides improved etching selectivity (by 2.4- fold) without backing thermostatic control (in the known case at cooling up to -70 C). Also, organic films were removed from backing completely. EFFECT: enhanced selectivity of etching.

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SU 1 351 426 A1

Authors

Agabekov V.E.

Potkin V.I.

Kaberdin R.V.

Gudimenko Ju.I.

Azarko V.A.

Ol'Dekop Ju.A.

Mitskevich N.I.

Dates

1996-12-27—Published

1985-04-25—Filed