FIELD: nanotechnology.
SUBSTANCE: invention relates to micro- and nanotechnology, particularly to use of chitosan polysaccharide and compounds thereof as resists for electron-beam lithography and photolithography for making micro- and nano-electronic and optical components. Invention relates to a method of exposing exposed areas of a film of chitosan, a salt or derivative thereof deposited on a substrate, involving bringing a film of chitosan, its salt or derivative thereof, which is applied on the substrate and subjected to exposure, into contact with a solution containing at least one transition element.
EFFECT: disclosed is use of polysaccharide compound in lithography.
44 cl, 11 dwg, 14 ex
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| METHOD OF PRODUCING NEGATIVE MASK | 0 |
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