FIELD: manufacture of electron devices. SUBSTANCE: method is related to process of ion cleaning and degassing of electrodes of electron devices at exhaust station. In accordance with proposed method gas which atomic mass is less than that of desorbed gas is pumped by successive steps into device volume, electrode is bombarded at each evacuation step. In this case energy of ions is selected directly proportional to square root of product of atomic masses of materials of electrode and desorbed gas. Method improves emission characteristics of cathodes and enables duration of evacuation of electron device to be reduced by 30-40% and vacuum in soldered off electron device to be improved approximately by an order. EFFECT: increased efficiency of cleaning of electrodes by desorption of atoms of inert gas implanted into material of electrodes. 1 dwg, 1 tbl
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Authors
Dates
1996-11-27—Published
1988-07-25—Filed