FIELD: semiconductor devices. SUBSTANCE: device for realization of method has depressurization chamber 1, loading window 2, vacuum valves 3, 4, pressure transducer 5, quadrupole sensor 6 of mass spectrometer, vacuum valve 7, analytic chamber 8, ion pump 9, vacuum slide valve 10, leak 11, tested package 12, second vacuum slide valve 13, vacuum pump 14, needle 15 to calcine package of microcircuit, vacuum valve 16, pressure transducer 17 and system 18 of heating of vacuum chambers. EFFECT: simplification of analysis by provision for capability of standardless analysis. 3 dwg
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Authors
Dates
1995-01-09—Published
1988-01-04—Filed