FIELD: methods of producing radionuclide ionizing radiation sources. SUBSTANCE: thallium radionuclide layer is deposited onto metal substrate, covered with zinc layer preliminary. Then protective covering of metal nickel is applied. Substrates may be galvanized by any known method, for example, electrochemical method may be used or by submergence into melted zinc. Thallium is chemically deposited onto galvanized substrate from aqueous solution of thallium salt with concentration 0.0005-0.1 g/l for metal at pH 1-4 during 10-200 minutes. The source is subsequently pressurized by means of electrochemical deposition of metal nickel layer onto thallium layer. Deposited nickel is tightly connected with metal thallium, being chemically deposited onto surface of galvanized substrate. EFFECT: improved reliability of sources; improved strength to climatic and mechanical influence. 2 tbl
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Authors
Dates
1994-06-30—Published
1990-07-20—Filed