METHOD FOR PRODUCING ION BEAM Russian patent published in 1996 - IPC

FIELD: ion-beam technology. SUBSTANCE: for ionizing working medium, use is made of plasma-beam discharge in crossed electric and magnetic fields with radial volume ion current. Radial current exceeds critical value of electron current associated with ion-sound instability occurring in plasma and strength of magnetic field. Discharge of this type generates fully ionized plasma with nonuniform density profile in direction perpendicular to magnetic field and uniform density in longitudinal direction. Ions are extracted in direction perpendicular to vector of longitudinal magnetic field flux density through emission hole provided in discharge chamber. EFFECT: 2-5 times increased ion current density, 3-5 times improved monochromaticity of ion beam, 30-50% reduced cost of power required to produce ion beam. 1 dwg