PLASMA ELECTRON SOURCE Russian patent published in 1997 - IPC

FIELD: generation of electrons. SUBSTANCE: plasma electron source has cathode, intermediate electrode with hole, anode, control and accelerating electrodes. Ring protrusion is made on surface of intermediate electrode facing cathode to stabilize current of electron beam and to increase electric strength of accelerating gap. Intermediate electrode is separated from cathode by plate which lateral dimension exceeds diameters both of cathode and protrusion. Distance between plate and intermediate electrode equal to inner diameter of ring protrusion is by an order bigger than diameter of hole. EFFECT: stabilization of current of electron beam and increase of electric strength of accelerating gap.