FIELD: semiconductor measurement technology. SUBSTANCE: sections with concentration of dope exceeding by not less than one order of magnitude concentration of dope in basic layer of same type of conductance are implanted into semiconductor structure of basic layer at boundary with emitter layer. In this case lateral dimension of these sections, distances between them and their depth meet a number of relationships specified in description of invention. EFFECT: reduced pumping power of circuit with commutation of heavy currents. 4 dwg
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Authors
Dates
1994-01-30—Published
1986-07-18—Filed