FIELD: integrated microelectronics; superhigh-speed transistors. SUBSTANCE: transistor has semiconductor collector, metallic-conductivity base, and emitter built up of conducting material and additional tunnel-thin insulating layer of thickness meeting equation D≥Ei/qEbr, where Ei is ionizing energy of collector material, J; Ebr is field intensity at insulation breakdown, V/m; q is electron charge, C. Additional layer of tunnel-thin insulation abuts base; metal or polysilicon with dope concentration of 1020-1021cm-3 is used as conducting material and silicon oxide, as tunnel-thin insulation. EFFECT: improved design. 2 cl, 2 dwg
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Authors
Dates
1996-06-20—Published
1992-04-06—Filed