METHOD FOR SURFACE TREATMENT QUALITY CHECK OF SEMICONDUCTOR PLATES Russian patent published in 1994 - IPC

Abstract RU 2008661 C1

FIELD: electrochemical methods of checking semiconductor materials. SUBSTANCE: plate under check is used as working electrode of electrochemical cell. The latter has, apart from working electrode, comparing electrode and auxiliary electrode. It also accommodates additional electrode made of material under check for deposition of impurities. EFFECT: facilitated procedure. 2 dwg

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RU 2 008 661 C1

Authors

Sarkarov T.Eh.

Sultanmagomedov S.N.

Boshevol'Nov V.B.

Dates

1994-02-28Published

1991-03-28Filed