FIELD: physical metallurgy. SUBSTANCE: billet or a detail is etched by ion bombardment of a powerful pulse ion beam having pulse duration 50-100 ns and energy-flux density 1·107-5·107 W/cm2. After ion etching the detail is annealed in vacuum at 300-600 C for 0.1-2.0 hour. EFFECT: improved quality of the product. 2 cl, 1 tbl
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Authors
Dates
1994-03-15—Published
1992-03-06—Filed