DEVICE FOR APPLICATION OF PHOTORESIST BY ROTATION Russian patent published in 1994 - IPC

Abstract RU 2012093 C1

FIELD: microelectronics. SUBSTANCE: device has centrifuge with rotating drive, holder for strips, and photoresist tank mounted on centrifuge shaft. Tank has sluice chamber which is essentially hollow ring concentrically mounted on common base and provided with through channels on inner wall. EFFECT: improved design. 4 dwg

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RU 2 012 093 C1

Authors

Ivanov A.S.

Valentinov M.M.

Nedospasov V.G.

Panov V.D.

Dates

1994-04-30—Published

1992-03-26—Filed