GEAR TO DEPOSIT PHOTORESIST ON PLATE Russian patent published in 1997 - IPC

FIELD: semiconductor technology. SUBSTANCE: invention refers to semiconductor technology and can be used to manufacture thin coats from photoresist on plates. Pneumatic gear to deposit photoresist on plates has case 1 with pneumatic chamber inside it connected to lines to feed compressed air and vacuum and to working zone 8, control unit connected to lines to feed compressed air and vacuum and metering device 9 to supply solution of photoresist located under working zone 8 of case 1 for positioning of plate 10. Case 1 is mounted immobile and its pneumatic chamber is divided into central 2 and peripheral 3 parts the latter is joined to line to feed compressed air and is fitted with nozzles situated on side of working zone 8 of case 1. Lines to feed compressed air and vacuum are provided with aids to change flow rate of compressed air positioned across their outlets and connected to control unit. Sensor of thickness of gas layer is installed on side of working zone. Working zone 8 to position plate 10 communicates with central part 2 of pneumatic chamber 4 and with its peripheral part 3. EFFECT: increased quality of coat thanks to prevention of mechanical contact with rotating base at stage of deposition of dose of solution of photoresist. 4 dwg, 1 tbl